[105] B. J. Lokhande, P.S. Patil, M.D, Uplane, Materials Letters
57 (2002) 573-579
[106] F-Josef Haug, <<High efficiency thin-film passivated
silicon solar cells and modules- THIFIC: Thin film on crystalline Si>>,
Thesis of doctorat, Swiss Federal Institute of technologie Zurich (2001).
[107] F. Ng-Cheng-Chin, M. Roslin, Z. H. Gu. T. Z. Fahidy,
J.Phys.D Appl.Phy;31(1998).
[108] J. Jacque Bessot, S. Audisio, Techniques de
l'ingénieur; traitement de surface M5,4 (1989), 1655-1660.
[109] L. A. Goodman, RCA Rev. 35(1974) 613.
[110] C. M. Lampert. Sol. Energy Mater. (1981) 6-11.
[111] K. T. Ramakrisha Reddy, T.B.S. Reddy, I. Forbes, R.W.
Miles, Surf. and Coat. Techn. 151-152 (2002) 110-113.
[114] G. Huertas « Etude de Nouveaux Matériaux
D'électrode Positive et d'électrolyte Solide Vitreux Sous Forme
de Couches minces pour des Couches Minces Microbatteries au Lithium »,
Thèse de doctorat, université de Bordeaux, (2006).
[115] R. Swanepoel, J. Phys. E 16 (1983) 1214
[116] N. F. Mott, E. A. Davis Electronic Process in
Non-crystalline Materials, Bristol, (1979)
[117] W. E. Spear et P. G. Le Comber, Solid St. Comm., 17 (1975)
1193
[118] J. Tauc, A. Menthe, J. Non-Cryst. Sol, 569 (1972) 8-10
[119] C.C. Chen, M.M. Nasrallah, and H.U. Anderson, J.
Electrochem. Soc., 12, 140, 3555 (2003).
[120] C.J. Brinker, G.C. Frye, A.J. Hurd, and C.S. Ashley, Thin
Solid Films, 1, 201, 97, (1991).
[121] N. Ekem, S. Korkmaz, S. Pat, M.Z. Balbag, E.N. Cetin, M.
Ozmumca, International Journal of Hydrogen Energy, 34, 5218-5222, (2009).
[122] En-Gang Fu, D-M. Zhuang, G. Zhang, Z. Ming, W-F. Yang and
J-J. Liu, Microelectronics Journal, 35, 383 (2004).
[123] F. K. Shan and Y. S. Yu, Journal of the European Ceramic
Society, 24,1869(2004)
[124] W. Tang and D.C. Cameron. Thin Solid Films,
238, 83(1994).
[125] Xu Zi-qiang. Deng Hong. Li Yan, Cheng Hang, Materials
Science in Semiconductor Processing 9,132-135 (2006).
[126] S.H. Jeong, B.N. Park, S.-B. Lee, J.-H. Boo, Surface &
Coatings Technology 201, 5318- 5322 (2007).
[127] C. Li, M. Furuta, T. Matsuda, T. Hiramatsu, H. Furuta, T.
Hirao, Thin Solid Films 517, 3265-3268 (2009).
[128] S. Venkatachalam, Y. Iida, Yoshinori Kanno, Superlattices
and Microstructures 44, 127- 135 (2008).
[129] R.K. Shukla, Anchal Srivastava, Atul Srivastava, K.C.
Dubey, Journal of Crystal Growth 294, 427-431 (2006).
[130] A. Neiderhofer, P. Nesladek, H.D. Männling, K. Moto,
S. Veprek and M. Jille, Surf. Coat. Technol, 173, 120-121 (1999).
[132] S.S. Kim and B. T. Lee, Thin Solid Films 446, 307
(2004).
[133] K.P. Bhuvana, J. Elanchezhiyan, N. Gopalakrishnan, T.
Balasubramanian, Applied Surface Science 255, 2026-2029 (2008).
[134] Qing Hua Li, Deliang Zhu, Wenjun Liu, Yi Liu, Xiao Cui Ma,
Applied Surface Science 254, 2922-2926 (2008).
[135] M. Rebien, W. Henrion, M. Bar, Ch-H.Fischer, Appl. Phys.
Lett ; 80, 18-35, (2002).
[136] L. A. Goodman, RCA Rev, 35, 613, (1974).
[137] J. Mass, P. Bhattacharya, R.S. Katiyar Materials Sciences
and Engineering B103, 9-15, (2003).
[138] I. Ozeroy, D. Nelson, A.V. Bulgakov, W. Marine, M. Sentis,
Applied Surface Science 212-213, 349-352, (2003).
[139] Xue-Yong Li, Hong-Jian Li, Zhi-Jun Wang, Hui Xia, Zhi-Yong
Xiong, Jun-Xi Wang,Bing- Chu Yang, Optics Communications 282, 247-252
(2009).
[140] Sang-Moo, Tomoaki Ikegami, Kenji Ebihara, Paik-Kyun Shin,
Applied Surface Science, 253, 1522-1527, (2006).
[141] Wei Lin, Ruixin Ma, Wei Shao, Bin Liu, Applied Surface
Science 253, 5179-5183 (2007).
[142] D. Bao, X. Yao, N. Wakiya, K. Shinozaki, N. Mizutani,
Appl. Phys. Lett. 79/3, 3767 (2001).
[143] Q H. Yashikawa and S. Adachi, Japonise Journal of Applied
Physics, 36, 6237 (1997).